| 光学 |
negatives Fotoresistsystem (it is one from which a negative of the mask used remains behind on the coated substrate, i.e. the resist remains where it is exposed to light); Negativlacksystem n (it is one from which a negative of the mask used remains behind on the coated substrate, i.e. the resist remains where it is exposed to light); negatives Resistsystem (it is one from which a negative of the mask used remains behind on the coated substrate, i.e. the resist remains where if is exposed to light) |
