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Electronics
containing
reactive etching
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chemically assisted reactive ion beam etching
化学辅助反应离子束蚀刻
deep reactive ion etching
深反应离子蚀刻
double-source excited reactive ion etching
双源激发反应离子蚀刻
electron cyclotron resonance reactive ion beam etching
电子回旋共振反应离子束蚀刻
electron cyclotron resonance reactive ion etching
电子回旋共振反应离子蚀刻
flap shield confined plasma reactive ion etching
隔板约束等离子体反应离子蚀刻
high pressure reactive ion etching
高压反应离子蚀刻
magnetically confined plasma reactive ion etching
磁约束等离子体反应离子蚀刻
magnetically enhanced reactive ion etch
process
磁增强反应离子蚀刻
工艺
magnetically enhanced reactive ion etching
磁增强反应离子蚀刻
magnetron enhanced reactive ion etching
磁控增强反应离子蚀刻
magnetron reactive ion etching
磁控反应离子蚀刻
metal-organic reactive ion etching
金属有机物反应离子蚀刻
methane/hydrogen/argon reactive ion etching
甲烷/氢/氩反应离子蚀刻
oxygen reactive ion etching
氧反应离子蚀刻
plasma-enhanced reactive ion etching
等离子体增强反应离子蚀刻
post-reactive ion etch
linewidth
反应离子蚀刻后
线宽
post-reactive ion etch across-chip linewidth variation
反应离子蚀刻后通片线宽变差
post-reactive ion etching annealing
反应离子蚀刻后退火
reactive atom-beam etching
反应原子束蚀刻
reactive beam ion beam etching
反应束离子束蚀刻
reactive fast atom beam etching
system
快速反应原子束蚀刻
系统
reactive ion etching resistance
抗反应离子蚀刻性
reactive magnetron ion etching
磁控反应离子蚀刻
reactive sputter etching
反应溅射刻蚀
reactive sputtering etching
反应溅射蚀刻
selective reactive ion etching
选择性反应离子蚀刻
single crystal
reactive etching
and metallization process
单晶反应蚀刻与金属化工艺
ultrahigh vacuum reactive ion beam etching
超高真空反应离子束蚀刻
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