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Terms for subject Electronics containing | all forms
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一次光两次显影single expose double develop
三维体光光学光刻模拟程序simulator for optical lithography three-dimensional volume exposure
专用光开关快门X射线光刻special exposure shutter
光窗口primary exposure window
二维光光强图形模拟程序simulator for two-dimensional intensity pattern in aligner
光电阴极电子投影光机photocathode electron projector
全圆片同时full wafer exposure
全息光指数holographic exposure index
全视场光系统full field exposure system
分步投影光机stepping-projection mask aligner
工艺double exposure process
光全息照相术double exposure holography
光法double exposure method
光终点检测技术double-exposure end-point detection (technique)
双面光水冷壁division wall
发光二极管间接光技术LED indirect exposure
可变轴线浸没透镜投影projection exposure with variable axis immersion lenses
可移动软接触掩蔽光法portable conformable masking method
同时光与显影simultaneous exposure and development
同时光与显影技术simultaneous exposure and development technique
国际商业机器公司自动聚焦对准投影光机IBM auto focus align
圆片电子束光机wafer electron beam printer
圆片直接direct wafer exposure
圆片载带光系统wafer tape exposure system
多重电子束光系统multiple electron beams exposure system
光间隙光学系统large exposure gap optics
X射线光量X-ray exposure
尼康分步重复光系统Nikon step-and-repeat exposure system
局部光剂量控制local exposure dose control
局部额外burn in
平台装置式气器充气器;通风机platform-mounted aerator
归一化光剂量normalized exposure dosage
扩大调焦范围技术focus latitude enhancement exposure
扫描投影光机scanning-projection mask aligner
抗蚀剂光邻近效应自洽校正技术self-consistent proximity effect correction technique for resist exposure
整片full wafer exposure
控制技术exposure control technique
量范围exposure latitude
量范围参数exposure latitude parameter
光不足光致抗蚀剂underexposed photoresist
光值light value
光光致抗蚀剂exposed photoresist
光剂量分布模型exposure dose distribution model
光剂量范围容度exposure dose latitude
光后放置时间post exposure delay time
光后焙烘post-exposure baking
光工位exposure station
光工段exposure station
光引生潜像exposure induced latent image
光强度分布函数exposure intensity distribution function
光强度变差法exposure intensity variation method
光机mask aligner
光比率计exposure rate meter
光潜像exposure induced latent image
光率exposure rate
光-离焦树exposure-defocus tree
光表photo meter
光计exposure meter
光过久over exposure
光量illumination quantity
光量下限lower exposure limit
光量-接近间隙关系曲线gap-exposure diagram
光量-离焦量关系曲线exposure-defocus diagram
光量-离焦量树exposure-defocus tree
光量阈值exposure threshold
光量限制exposure limit
晒蒸发池solar evaporation pond
辐射量radiant exposure
光的unexposed
机械气管mechanical aerator
束斑扫描光模拟程序simulator for spot scanning exposure
激光引laser-supported detonation
光剂量分布函数point exposure distribution function
特征尺寸-光剂量依从关系feature size depending dose
生产级电子束光系统manufacturing electron beam exposure system
电子electronic exposure
电子束光用化学放大式甲硅烷基抗蚀剂silylating resist using chemical amplification for electron beam
直写式分步重复电子束direct writing step-and-repeat electron-beam exposure
直接光膜direct exposure film
直接分步direct stepping exposure
相干截止光线宽linewidth at the coherent cutoff
矢量扫描电子束光机vector scan electron beam machine
磁锥焦管光电阴极电子投影光机magnetic funnel photocathode electron projector
离子束投影光机ion beam projector
离子束接近光机ion beam proximity printer
移相掩模边缘增强光对准补偿法PSM exposure alignment compensation method for edge enhancement
自动控制automatic exposure control
自动控制技术automatic exposure control technique
自动光表automatic exposure meter
表面surface aeration
计算机控制电子束光系统computer-controlled electron beam exposure system
转子式rotor aeration
光量抗蚀剂resist for a light exposure
over exposure
连续多重扫描continuous multiple scanning exposure
迭加光量法repeated exposures method
透射比-光量关系曲线transmittance-exposure curve
邻区光量proximity exposure
邻区光量补偿proximity exposure compensation
邻近效应proximity exposure
邻近效应校正proximity exposure compensation
重复光法repeated exposures method
间歇多重扫描intermittent multiple scanning exposure (SRXL)
限制实际光时间limiting actual exposure time
高压电子束光系统high voltage electron beam exposure system