Subject: Помогите, чем можете Помогите,пожалуйста, с переводом словосочетаний: sparse line patterns,dense line patterns, sparse feature, line dose, range of doses To examine the viability of the resists for nanolithogra-phy, sparse and dense line patterns were written using the Raith lithography system. Fig. 4a shows lines and spaces with a half pitch of 25 nm written in Resist В with a line dose of 140 pC/cm. A PAB of 75 °C for 600 s and a РЕВ of 90 °C for 180 s were applied prior to development. The LWR of these lines was measured to be 4.0 nm. In comparison the line dose required by a pure fullerene film would be approximately 10,000 pC/cm. Fig. 4b shows sparse features with a line width of 15 nm written with a line dose of 240 pC/cm. In this case no PAB was applied and the РЕВ was as before. The LWR for these lines was 6.0 nm. In the case of Resist В the best line width rough¬ness was found to be 2.4 nm, measured on 18 nm sparse lines exposed at ~600 pC/cm. |
sparse line patterns - low density resolution patterns dense line patterns - high density resolution patterns
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resolution test pattern - штриховая мира |
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