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| 은폐형 (Exhibiting characteristics that allow malicious software to evade detection by ordinary means) | |||
| Anglais glossaire | |||
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| system for proximity effect correction for advanced lithography and reticle | |||
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STEALTH : 1 phrases, 1 sujets |
| Microsoft | 1 |
|
| |||
| 은폐형 (Exhibiting characteristics that allow malicious software to evade detection by ordinary means) | |||
| Anglais glossaire | |||
| |||
| system for proximity effect correction for advanced lithography and reticle | |||
|
STEALTH : 1 phrases, 1 sujets |
| Microsoft | 1 |